当研究室の研究成果がElectrochemistry Communications誌に抄録されました．
当該論文：T. Homma, A. Kato, M. Kunimoto, M. Yanagisawa, “Direct observation of the diffusion behavior of an electrodeposition additive in through-silicon via using in situ surface enhanced Raman spectroscopy”, 88, 34-38 (2018).